Indigenous Microfabrication Techniques from IISERB Advance India’s Semiconductor Mission
Nanometre- to micron-scale patterning using photomasks and hard masks is fundamental to modern semiconductor chip fabrication. However, conventional mask fabrication techniques rely on costly infrastructure, specialized cleanroom facilities, and toxic chemicals, limiting access for many researchers in India. Addressing this challenge, researchers at IISER Bhopal have developed a low-cost, carbon-efficient microfabrication technique that simplifies key steps in semiconductor manufacturing. The work was led by Dr. Santanu Talukder, Principal Investigator of the Sixth Sense Lab in the Department of Electrical Engineering and Computer Science, along with his student Dr. Swapnendu Ghosh and Mr. Debjit De Sarkar. Their method enables the fabrication of photomasks and hard masks using nanometre-thin chromium films, a material widely employed in the semiconductor industry. By spatially confining an electrochemical oxidation reaction beneath an ultra-sharp metal probe, the technique allows researchers to directly “write” patterns onto chromium surfaces, much like using a pen on paper. Notably, the process eliminates the need for intermediate resist layers, expensive lithography tools, or hazardous chemicals. By addressing two critical bottlenecks in device fabrication, namely lithography and etching, the approach integrates smoothly with existing process flows. Aligned with the India Semiconductor Mission and the United Nations Sustainable Development Goals, this innovation has the potential to democratize microfabrication research and strengthen India’s semiconductor ecosystem. For more details, kindly visit https://doi.org/10.1016/j.mne.2026.100353; https://doi.org/10.1016/j.mne.2025.100320.
